In the past, ULIS faced a major crisis which impacted the functionality of the big-runner products. The application JMP® was successfully used during the 3 main steps of crisis resolution, using the 8D methodology:
- - Problem description:
- A confidence interval calculation was used in order to compare the failure rates by product.
- The “power platform” was used in order to determine whether the defect was originally present or if it was caused by a process drift.
- Custom Wafermaps were created in the “Graph builder platform” in order to locate the defect on silicon wafers. The graph builders’ user-friendly interface was also helpful in creating chronograms of batch process histories and in determining when the problem appeared.
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- - Root cause analysis and Permanent Corrective Action:
- By using JMP®‘s custom designer “distribution platform” and creating screening and response surface experiments, a gas rate variation was found to effect the failure rate.
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- Permanent Corrective Action efficiency validation:
- The “power platform” was used to determine the mandatory minimum sample size for validating the efficiency of the corrective action with a reasonable level of confidence (power=80%).
Finally, JMP® has been a key contributor to the success of this crisis resolution.
