SCD (SemiConductor Devices), a global leader in the design and production of advanced infrared detectors and systems, is recognized for its cutting-edge technology and innovation in electro-optical solutions. As a fast-growing company, SCD operates in an environment where development times must be reduced, since being the first to present new products is critical to maintaining a competitive edge. To meet these demands, SCD adopts innovative approaches such as design of experiments (DOE) to accelerate process optimization and product development.

In this work, we demonstrate the flexible application of DOE to improve the performance of a device fabricated through a two-stage Reactive Ion Etching (RIE) process. Initially, a series of experiments was planned using JMP DOE. Early insights into the process behavior indicated the need to adjust the design space. As the DOE progressed, a deeper understanding of the underlying mechanisms emerged, leading us to modify the process chemistry.

This study highlights the importance of flexibility in DOE approaches, showing that real-world experimentation may require evolving the experimental plan. Ultimately, our work emphasizes that while DOE may not always yield a final predictive model, it can lead to valuable insights into process mechanisms, contributing to better decision making and process control.