Laura Lancaster, JMP Principal Research Statistician Developer, SAS
Jianfeng Ding, Senior Research Statistician Developer, JMP

In this age of big data and complex manufacturing there is often an enormous amount of process data that needs to be monitored and analyzed to maintain or improve quality. JMP has several tools to help the analyst quickly and efficiently increase the scale of their process monitoring. The Process Screening platform allows users to easily scan processes for stability and capability and enables them to focus attention on processes needing improvement. The platform initially computes a summary report based on control chart, capability and stability calculations, and creates several graphs for quick visual assessment of process health. Based on these initial results, it is easy to select the processes needing attention and explore them more in depth with access to Control Chart Builder and Process Capability. The Model Driven Multivariate Control Chart (MDMCC) platform, new in JMP 15, allows users to monitor large amounts of highly correlated processes. This platform can be used in conjunction with the PCA and PLS platforms to monitor multivariate process variation over time, give advanced warnings of process shifts, and suggest probable causes of process changes. We will use case studies to demonstrate how to use JMP to monitor and analyze many processes for fast and efficient improvement.